Publication | Closed Access
50 nm vertical replacement-gate (VRG) nMOSFETs with ALD HfO2 and Al2O3 gate dielectrics
19
Citations
7
References
2001
Year
Unknown Venue
Electrical EngineeringEngineeringNanoelectronicsElectronic EngineeringBias Temperature InstabilityApplied PhysicsAld Hfo2Nm Vertical Replacement-gateMicroelectronicsSemiconductor Device
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