Plasma-enhanced atomic layer deposited HfO2 films using a novel heteroleptic cyclopentadienyl-based Hf precursor

Surface chemistry of atomic layer deposition: A case study for the trimethylaluminum/water process

Riikka L. Puurunen · Journal of Applied Physics · 2005 · 2.5K citations

Materials Science, Surface Technology, Chemical Engineering +14

Plasma-Assisted Atomic Layer Deposition: Basics, Opportunities, and Challenges

Harald B. Profijt, Stephen E. Potts, M. C. M. van de Sanden et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 864 citations · Full text

Materials Science, Materials Engineering, Chemical Engineering +13

High-K materials and metal gates for CMOS applications

John Robertson, Robert M. Wallace · Materials Science and Engineering R Reports · 2014 · 730 citations

Electrical Engineering, Engineering, Nanoelectronics +6

A Clear, Strong, and Thermally Insulated Transparent Wood for Energy Efficient Windows

Ruiyu Mi, Tian Li, Daniel Dalgo et al. · Advanced Functional Materials · 2019 · 612 citations

Materials Science, Wood Modification, Optical Materials +15

Review and perspective on ferroelectric HfO2-based thin films for memory applications

Min Hyuk Park, Young Hwan Lee, Thomas Mikolajick et al. · MRS Communications · 2018 · 528 citations

Materials Science, Engineering, Ferroelectric Application +8