Atomic Layer Deposition Interfaces is a semiconductor interface phenomenon defined as the atomically precise boundary region formed between successive material layers during the sequential, self-limiting surface reactions characteristic of atomic layer deposition, distinguished by its controlled interfacial chemistry and minimal defect density arising from the layer-by-layer growth mechanism.
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GaAs interfacial self-cleaning by atomic layer deposition
Christopher L. Hinkle, Arif Sonnet, Eric M. Vogel et al. · Applied Physics Letters · 2008 · 382 citations · Full text
Natural Sciences, Materials Engineering, Materials Science +17
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