Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth

Yunchang Jang, Hyun-Joon Roh, Seolhye Park, Sangmin Jeong, Sanywon Ryu, Ji-Won Kwon, Nam‐Kyun Kim, Gon‐Ho Kim

Current Applied Physics · 2019 · 11 citations · 27 references

Concepts

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