Seolhye Park

2022 Review of Data-Driven Plasma Science

Rushil Anirudh, M. Salman Asif, Markus M. Becker et al. · IEEE Transactions on Plasma Science · 2023 · 73 citations · Full text

Artificial Intelligence, Engineering, Plasma Science +18

Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

Seolhye Park, Sangmin Jeong, Yunchang Jang et al. · IEEE Transactions on Semiconductor Manufacturing · 2015 · 38 citations

Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables

Hyun-Joon Roh, Sangwon Ryu, Yunchang Jang et al. · IEEE Transactions on Semiconductor Manufacturing · 2018 · 36 citations

Nitride Thickness, Engineering, Measurement +22

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma

Ji-Won Kwon, Sangwon Ryu, Jihoon Park et al. · Materials · 2021 · 26 citations · Full text

Characteristics of a non-Maxwellian electron energy distribution in a low-pressure argon plasma

Seolhye Park, Jae-Myung Choe, Hyun-Joon Roh et al. · Journal of the Korean Physical Society · 2014 · 21 citations