Yunchang Jang - Concepedia

Author

Yunchang Jang

Seoul National University ORCID

Also Known As

Y. JANG, Y. Jang, Y.-I. Jang, Ye–Eun Jang, Yun-Chang Jang, Yunchang Jang

Publications

174

Citations

H-Index

Concepts

All Affiliations

Seoul National University Samsung (South Korea)

About

Yunchang Jang is an author at Seoul National University specializing in engineering, metrology, and applied physics.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	5	5	83
2	Applied Physics	3	3	57
3	Education	2	2	47
4	Computer Engineering	2	2	26
5	Business	1	1	16

Yunchang Jang

Publications

147

Citations

H-Index

Page 1

	Year	Citations
Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters Seolhye Park, Sangmin Jeong, Yunchang Jang, IEEE Transactions on Semiconductor Manufacturing	2015	38
Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables Hyun-Joon Roh, Sangwon Ryu, Yunchang Jang, IEEE Transactions on Semiconductor Manufacturing Nitride ThicknessEngineeringMeasurementOptical TestingEducation	2018	36
Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma Ji-Won Kwon, Sangwon Ryu, Jihoon Park, Materials	2021	26
Plasma information-based virtual metrology (PI-VM) and mass production process control Seolhye Park, Jaegu Seong, Yunchang Jang, Journal of the Korean Physical Society Virtual ManufacturingEngineeringVirtual EngineeringIndustrial EngineeringProduction Process Control	2022	16
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Yunchang Jang, Hyun-Joon Roh, Seolhye Park, Current Applied Physics EngineeringPhysicsMeasurementMicrofabricationCalibration	2019	11
Ion-neutral collision effect on ion-ion two-stream-instability near sheath-presheath boundary in two-ion-species plasmas Nam‐Kyun Kim, Jaemin Song, Hyun-Joon Roh, Plasma Sources Science and Technology Two-ion-species PlasmasEngineeringPlasma SciencePlasma PhysicsPlasma Instabilities	2017	10
Cause analysis of the faults in HARC etching processes by using the PI‐VM model for OLED display manufacturing Seolhye Park, Yunyoung Kyung, Juyoung Lee, Plasma Processes and Polymers EngineeringCause AnalysisPi‐vm ModelPlasma ProcessingDisplay Technology	2019	10

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