Yunchang Jang

Enhancement of the Virtual Metrology Performance for Plasma-Assisted Oxide Etching Processes by Using Plasma Information (PI) Parameters

Seolhye Park, Sangmin Jeong, Yunchang Jang et al. · IEEE Transactions on Semiconductor Manufacturing · 2015 · 38 citations

Development of the Virtual Metrology for the Nitride Thickness in Multi-Layer Plasma-Enhanced Chemical Vapor Deposition Using Plasma-Information Variables

Hyun-Joon Roh, Sangwon Ryu, Yunchang Jang et al. · IEEE Transactions on Semiconductor Manufacturing · 2018 · 36 citations

Nitride Thickness, Engineering, Measurement +22

Development of Virtual Metrology Using Plasma Information Variables to Predict Si Etch Profile Processed by SF6/O2/Ar Capacitively Coupled Plasma

Ji-Won Kwon, Sangwon Ryu, Jihoon Park et al. · Materials · 2021 · 26 citations · Full text

Plasma information-based virtual metrology (PI-VM) and mass production process control

Seolhye Park, Jaegu Seong, Yunchang Jang et al. · Journal of the Korean Physical Society · 2022 · 16 citations

Virtual Manufacturing, Engineering, Virtual Engineering +13

Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth

Yunchang Jang, Hyun-Joon Roh, Seolhye Park et al. · Current Applied Physics · 2019 · 11 citations

Engineering, Physics, Measurement +11