IEEE Electron Device Letters · 2018 · 52 citations · 8 references
EngineeringElectrical EngineeringMaterials ScienceMicroelectronicsSemiconductor DevicesSemiconductor MaterialsDevice CharacterizationField-effect TransistorsHigh-frequency Semiconductor DevicesMicrowave Semiconductor DevicesSemiconductor Device MaterialsSemiconductor PhysicsChemical Vapor Deposition MaterialsGallium Nitride (Gan) MaterialsLinearityMetal-organic Chemical Vapor DepositionMicrowave TransistorsPower OutputSmall-signal Gain
We report on the power and linearity performance of metal organic chemical vapor deposition grown AlGaN channel polarization-graded field-effect transistor (PolFET). The fabricated transistors with 3-D electron channels showed nearly flat transconductanceprofiles. Maximum f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> and fmax of 23 and 65 GHz were measured for 0.7-μm gate-length transistors, corresponding to an f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">T</sub> -L <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">G</sub> product of 16.2 GHz·μm. Load-pull measurement at 10 GHz revealed a maximum output power of 2 W/mm with a maximum small signal gain of 16 dB. Two-tone measurement at 10 GHz showed an OIP3 of 33 dBm for 150-μm device width and a corresponding linearity figure-of-merit OIP3/PDC of 3.4 dB. These results suggest that PolFETs could be useful for high-frequency applications requiring high linearity.
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Tomás Palacios, Siddharth Rajan, A. Chakraborty et al. · IEEE Transactions on Electron Devices · 2005 · 209 citations