Concepedia

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet

Jiao Jiao Li, Qianghua Yuan, Xiao-wei Chang, Yong Wang, Guiqin Yin, Chenzhong Dong

Plasma Science and Technology · 2017 · 17 citations · 36 references

DOI

Concepts

Abstract

Deposition of organosilicone thin film from hexamethyldisiloxane (HMDSO) with 50 kHz/33 MHz dual-frequency atmospheric-pressure plasma jet, LI, Jiaojiao, YUAN, Qianghua, CHANG, Xiaowei, WANG, Yong, YIN, Guiqin, DONG, Chenzhong

References

36

Infrared spectroscopic study of SiO<i>x</i> films produced by plasma enhanced chemical vapor deposition

P. G. Pai, S. S. Chao, Yasuo Takagi et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 799 citations

, , +17

Structural investigation of silica gel films by infrared spectroscopy

Rui M. Almeida, Carlo G. Pantano · Journal of Applied Physics · 1990 · 452 citations

, , +16

Local bonding environments of Si–OH groups in SiO2 deposited by remote plasma-enhanced chemical vapor deposition and incorporated by postdeposition exposure to water vapor

Jeremy Theil, D. V. Tsu, M. W. Watkins et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1990 · 178 citations

, , +17

SiO<sub>2</sub> Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy

B. B. Burton, Sang‐Woo Kang, Seung-Whee Rhee et al. · The Journal of Physical Chemistry C · 2009 · 165 citations

, , +16

Microplasma jet at atmospheric pressure

Yong Cheol Hong, Han S. Uhm · Applied Physics Letters · 2006 · 142 citations

, , +14