B. B. Burton - Concepedia

Concepedia

Author

B. B. Burton

University of Colorado Boulder

Also Known As

B. B. Burton, B.B. Burton, Beau B Burton, Beau B. Burton

10

Publications

1.3K

Citations

9

H-Index

32

Concepts

All Affiliations

University of Colorado Boulder

BB

About

B. B. Burton is an author at University of Colorado Boulder specializing in engineering, surface science, and chemical engineering.

Top Concepts

#	Concept	H-Index	Publications	Citations
1	Engineering	8	8	934
2	Chemical Engineering	7	7	836
3	Chemistry	5	5	712
4	Applied Physics	3	3	309
5	Electrical Engineering	1	1	98

B. B. Burton

×

9

Publications

1.3K

Citations

9

H-Index

	Year	Citations
Gas Diffusion Barriers on Polymers Using Multilayers Fabricated by Al<sub>2</sub>O<sub>3</sub> and Rapid SiO<sub>2</sub> Atomic Layer Deposition Arrelaine A. Dameron, Stephen D. Davidson, B. B. Burton, The Journal of Physical Chemistry C	2008	370
Molecular Layer Deposition of Alucone Polymer Films Using Trimethylaluminum and Ethylene Glycol Arrelaine A. Dameron, Dragos Seghete, B. B. Burton, Chemistry of Materials Ethylene GlycolEngineeringChemistryChemical DepositionPolymers	2008	335
SiO<sub>2</sub> Atomic Layer Deposition Using Tris(dimethylamino)silane and Hydrogen Peroxide Studied by in Situ Transmission FTIR Spectroscopy B. B. Burton, Sang‐Woo Kang, Seung-Whee Rhee, The Journal of Physical Chemistry C Oxide HeterostructuresMaterials ScienceChemical EngineeringHydrogen Peroxide StudiedEngineering	2009	161
Steady-state and transient photoconductivity in c-axis GaN nanowires grown by nitrogen-plasma-assisted molecular beam epitaxy Norman A. Sanford, Paul T. Blanchard, K. A. Bertness, Journal of Applied Physics Wide-bandgap SemiconductorEngineeringTransient PhotoconductivityOptoelectronic DevicesSemiconductors	2010	98
Atomic Layer Deposition of MgO Using Bis(ethylcyclopentadienyl)magnesium and H<sub>2</sub>O B. B. Burton, David N. Goldstein, Steven M. George The Journal of Physical Chemistry C Materials EngineeringMaterials ScienceChemical EngineeringSequential ExposuresEngineering	2009	86
Atomic layer deposition of MnO using Bis(ethylcyclopentadienyl)manganese and H2O B. B. Burton, F. Fabreguette, Steven M. George Thin Solid Films Materials ScienceChemical EngineeringEngineeringOxide ElectronicsSurface Science	2009	74
Tantalum Nitride Atomic Layer Deposition Using (tert-Butylimido)tris(diethylamido)tantalum and Hydrazine B. B. Burton, Adrien R. Lavoie, Steven M. George Journal of The Electrochemical Society Materials EngineeringInorganic ChemistryChemical EngineeringMaterials ScienceAld Growth Rate	2008	73
Passivation of pigment-grade TiO<sub>2</sub>particles by nanothick atomic layer deposited SiO<sub>2</sub>films David M. King, Xinhua Liang, B. B. Burton, Nanotechnology EngineeringInorganic PhotochemistryAnatase Pigment-grade TioChemistryChemical Deposition	2008	57
Rapid SiO<sub>2</sub> Atomic Layer Deposition Using Tris(<i>tert</i>-pentoxy)silanol B. B. Burton, M. Bolesławski, A. T. Desombre, Chemistry of Materials Materials ScienceChemical EngineeringCross-linking ReactionEngineeringSurface Science	2008	50

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