Monitoring of stress reduction in shallow trench isolation CMOS structures via synchrotron X-ray topography, electrical data and raman spectroscopy

P.J. McNally, J. Curley, M. Bolt, A. Reader, T. Tuomi, R. Rantama ̈ki, A.N. Danilewsky, Ingrid DeWolf

Journal of Materials Science Materials in Electronics · 1999 · 15 citations · 10 references

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