Growth characteristics and electrical properties of SiO2 thin films prepared using plasma-enhanced atomic layer deposition and chemical vapor deposition with an aminosilane precursor

Hanearl Jung, Woo‐Hee Kim, Il‐Kwon Oh, Chang-Wan Lee, Clément Lansalot‐Matras, Su Jeong Lee, Jae-Min Myoung, Han‐Bo‐Ram Lee, Hyungjun Kim

Journal of Materials Science · 2016 · 42 citations · 38 references

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