Failure analysis requirements for nanoelectronics

Abstract

Failure analysis (FA) plays a vital role in the development and manufacture of integrated circuits. However, instrumental limits are already threatening FA in the tenth-micron CMOS realm, and nanoelectronic devices will find key analytical tools two orders of magnitude removed in capability. This paper will introduce state-of-the-art microelectronic failure analysis processes, instrumentation, and principles. It will discuss the major limitations and future prospects determined from industry roadmaps. Specifically highlighted is the need for a fault isolation methodology for failure analysis of fully integrated nanoelectronics devices.