Multilevel metal capacitance models for CAD design synthesis systems

Abstract

An empirical model for multilevel interconnect capacitance is presented. This is the first model that allows designers to compute capacitances of arbitrary complex metal geometries. Such flexibility is achieved by a novel strategy of constructing complex geometries from simple primitive cells. Agreement with accurate simulations and measurements is within 8% over an extensive range of dimensions.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>