Temperature dependence of the surface reactivity of SiH3 radicals and the surface silicon hydride composition during amorphous silicon growth - Concepedia

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Temperature dependence of the surface reactivity of SiH3 radicals and the surface silicon hydride composition during amorphous silicon growth

34

Citations

22

References

2003

Year

W. M. M. Kessels, J.P.M. Hoefnagels, P.J. van den Oever, Y. Barrell, M. C. M. van de Sanden

Surface Science

Materials ScienceEngineeringSurface ScienceSih3 RadicalsAmorphous Silicon GrowthChemistryAmorphous SolidSilicon On InsulatorSurface Reactivity

References

	Year	Citations

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