Journal of Applied Physics · 1990 · 113 citations · 28 references
Radical EmissionEngineeringNuclear PhysicsGlow DischargeChemistryPlasma ProcessingChemical EngineeringApplied Physics 15High-energy Nuclear ReactionPhysicsEngineering PhysicsSilane Glow DischargesOptoelectronicsExperimental Nuclear PhysicsNatural SciencesSurface ScienceApplied PhysicsSurface Reaction ProbabilityGas Discharge PlasmaChemical Kinetics
Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation D. A. Doughty, J. R. Doyle, G. H. Lin, A. Gallagher; Surface reaction probability of film‐producing radicals in silane glow discharges. Journal of Applied Physics 15 May 1990; 67 (10): 6220–6228. https://doi.org/10.1063/1.345188 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAIP Publishing PortfolioJournal of Applied Physics Search Advanced Search |Citation Search
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