P.J. van den Oever

Production Mechanisms of NH and NH₂ Radicals in N₂−H₂ Plasmas

J. H. van Helden, P.J. van den Oever, W. M. M. Kessels et al. · The Journal of Physical Chemistry A · 2007 · 52 citations

Flux Densities, Engineering, Plasma Science +19

Industrial high-rate (∼5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions

Bram Hoex, A. Erven, R.C.M. Bosch et al. · Progress in Photovoltaics Research and Applications · 2005 · 42 citations · Full text

Engineering, Optoelectronic Devices, Thin Film Process Technology +23

Density and production of NH and NH2 in an Ar–NH3 expanding plasma jet

P.J. van den Oever, J. H. van Helden, Carolien C. H. Lamers et al. · Journal of Applied Physics · 2005 · 36 citations · Full text

Engineering, Plasma Science, Plasma Physics +18

Temperature dependence of the surface reactivity of SiH3 radicals and the surface silicon hydride composition during amorphous silicon growth

W. M. M. Kessels, J.P.M. Hoefnagels, P.J. van den Oever et al. · Surface Science · 2003 · 34 citations

Materials Science, Engineering, Surface Science +6

N, NH, and NH2 radical densities in a remote Ar–NH3–SiH4 plasma and their role in silicon nitride deposition

P.J. van den Oever, J. H. van Helden, J. Leo van Hemmen et al. · Journal of Applied Physics · 2006 · 23 citations · Full text

Nh3 Flow, Remote Ar–nh3–sih4 Plasma, Chemical Engineering +12