Y. Barrell

Time-resolved cavity ringdown study of the Si and SiH3 surface reaction probability during plasma deposition of a-Si:H at different substrate temperatures

J.P.M. Hoefnagels, Y. Barrell, W. M. M. Kessels et al. · Journal of Applied Physics · 2004 · 41 citations · Full text

Natural Sciences, Materials Science, Physics +17

On the hexamethyldisiloxane dissociation paths in a remote Ar-fed expanding thermal plasma

Mariadriana Creatore, Y. Barrell, Jan Benedikt et al. · Plasma Sources Science and Technology · 2006 · 38 citations

Natural Sciences, Chemistry, Physics +16

Temperature dependence of the surface reactivity of SiH3 radicals and the surface silicon hydride composition during amorphous silicon growth

W. M. M. Kessels, J.P.M. Hoefnagels, P.J. van den Oever et al. · Surface Science · 2003 · 34 citations

Natural Sciences, Chemistry, Materials Science +16

Expanding thermal plasma for low-k dielectrics: engineering the film chemistry by means of specific dissociation paths in the plasma

Mariadriana Creatore, W. M. M. Kessels, Y. Barrell et al. · Materials Science in Semiconductor Processing · 2004 · 24 citations

Natural Sciences, Materials Science, Physics +15

Expanding thermal plasma for fast deposition of scratch-resistant SiCxHyOz films

Y. Barrell, Mariadriana Creatore, M. Schaepkens et al. · Surface and Coatings Technology · 2003 · 23 citations

Natural Sciences, Materials Engineering, Materials Science +16