IEEE Electron Device Letters · 2011 · 17 citations · 9 references
EngineeringComputer EngineeringElectrical EngineeringMicroelectronicsSemiconductor DevicesVlsi DesignCmos Circuit DesignComplementary Metal-oxide-semiconductor TechnologyMemory DevicesMetal-oxide-semiconductor Field-effect TransistorsCmos Logic CircuitsCmos Logic DesignComplementary Metal-oxide-semiconductor LogicFloating-gate MemoryMemory Circuit DesignMemory CircuitsNonvolatile MemoryNonvolatile Memory Devices
This letter presents a novel differential p-channel logic-compatible multiple-time programmable (MTP) memory cell. This MTP cell has a pair of floating gates, and performs differential read to increase the on/off window. Additionally, a novel self-recovery operation is implemented to boost the floating gate level, thus avoiding the charge-loss problem due to the thin gate oxide requirement in advance logic nonvolatile memory applications. This differential cell with its self-recovery operation is a very promising MTP solution for gate oxide layer with a 70 Å thickness, and can be implemented by 3.3 V I/O in 90 nm and the advanced CMOS logic processes such as 45 nm and beyond.
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A Novel Embedded OTP NVM Using Standard Foundry CMOS Logic Technology
Jing Peng, Glen Rosendale, Michael Fliesler et al. · 2006 · 39 citations
Engineering, Computer Engineering, Electrical Engineering +17
Limitations on oxide thicknesses in flash EEPROM applications
E.F. Runnion, S.M. Gladstone, R.S. Scott et al. · 1996 · 27 citations