GaAs/AlGaAs heterojunction bipolar transistors for integrated circuit applications

W. V. McLevige, Huihua Yuan, W. M. Duncan, William R. Frensley, F.H. Doerbeck, H. Morkoç, T. J. Drummond

IEEE Electron Device Letters · 1982 · 33 citations · 8 references

Concepts

Abstract

Molecular-beam epitaxy (MBE) and ion implantation were used to fabricate GaAs/AlGaAs heterojunction bipolar transistors with buried wide bandgap emitters. Inverted-mode current gains of ∼ 100 were obtained, demonstrating the feasibility of this technology for I <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> L types of digital integrated circuits.

References

8