Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer

Thin Dielectric Film Thickness Determination by Advanced Transmission Electron Microscopy

Alain C. Diebold, Brendan Foran, C. Kisielowski et al. · Microscopy and Microanalysis · 2003 · 64 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +10

Total reflection X-ray fluorescence of single and multiple thin-layer samples

Dick K. G. de Boer, W. W. van den Hoogenhof · Spectrochimica Acta Part B Atomic Spectroscopy · 1991 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +13

X-ray induced fluorescence spectrometry at grazing incidence for quantitative surface and layer analysis

U. Weisbrod, R. Gutschke, J. Knoth et al. · Analytical and Bioanalytical Chemistry · 1991 · 41 citations

Natural Sciences, Chemistry, Materials Science +13

Treatment of roughness and concentration gradients in total Reflection X-ray fluorescence analysis of surfaces

H. Schwenke, R. Gutschke, J. Knoth et al. · Applied Physics A · 1992 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +14

The effects of surface roughness on the angle-dependent total-reflection x-ray fluorescence of ultrathin films

Kouichi Tsuji, Takashi Yamada, T. Utaka et al. · Journal of Applied Physics · 1995 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +17