Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon - Concepedia

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Annealing behavior of phosphorus in native oxide films on heavily phosphorus doped silicon

14

Citations

4

References

1996

Year

W.B. Ying, Yusuke Mizokawa, Yaozhong Yu, Y. Kamiura, Makio Iida, K. Kawamoto

Applied Surface Science

Materials EngineeringMaterials ScienceEpitaxial GrowthEngineeringNanoelectronicsOxide ElectronicsApplied PhysicsSemiconductor MaterialPhosphoreneSilicon On InsulatorMicroelectronicsNative Oxide Films

References

	Year	Citations

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