Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism - Concepedia

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Atomic layer deposition of titanium dioxide from TiCl4 and H2O: investigation of growth mechanism

226

Citations

19

References

2001

Year

Jaan Aarik, Aleks Aidla, Hugo Mändar, Teet Uustare

Applied Surface Science

Materials EngineeringMaterials ScienceChemical EngineeringEngineeringTitanium DioxideSurface ScienceTitanium Dioxide MaterialsPhotocatalysisChemistryGrowth MechanismChemical DepositionChemical Vapor DepositionAtomic Layer Deposition

References

	Year	Citations

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