Influence of γ radiation on thin Ta2O5–Si structures

Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

C. Chaneliere, Jean‐Luc Autran, R. A. B. Devine et al. · Materials Science and Engineering R Reports · 1998 · 676 citations

Natural Sciences, Materials Engineering, Materials Science +14

AES and XPS study of thin RF-sputtered Ta2O5 layers

E. Atanassova, T. Dimitrova, J. Koprinarova · Applied Surface Science · 1995 · 202 citations

Natural Sciences, Materials Engineering, Materials Science +8

X-ray photoelectron spectroscopy of thermal thin Ta2O5 films on Si

E. Atanassova, D. Spassov · Applied Surface Science · 1998 · 162 citations

Natural Sciences, Materials Science, Physics +14

Leakage Current Mechanism of Amorphous and Polycrystalline Ta2 O 5 Films Grown by Chemical Vapor Deposition

Tomonori Aoyama, S. Saida, Y. Okayama et al. · Journal of The Electrochemical Society · 1996 · 86 citations

Natural Sciences, Materials Engineering, Materials Science +17

Ultrathin Tantalum Oxide Capacitor Dielectric Layers Fabricated Using Rapid Thermal Nitridation prior to Low Pressure Chemical Vapor Deposition

Satoshi Kamiyama, Pierre‐Yves Lesaicherre, Hiroshi Suzuki et al. · Journal of The Electrochemical Society · 1993 · 85 citations

Natural Sciences, Materials Engineering, Materials Science +17