Thermal Oxidation is a high-temperature chemical process in semiconductor manufacturing wherein silicon reacts with an oxidizing atmosphere to form a thin, insulating layer of silicon dioxide, distinguishing it from alternative passivation or oxidation techniques by its reliance on elevated thermal energy to drive the reaction.
3.5K
Publications
167.8K
Citations
11.8K
Authors
2.1K
Institutions
Publications per year
2017–2026
634
Publications
3.5K
Comparison of IMPROVE and NIOSH Carbon Measurements
Judith C. Chow, John G. Watson, Dale Crow et al. · Aerosol Science and Technology · 2001 · 886 citations
1–5 of 3.5K
Authors
11.8K
- EAE. A. Irene
University of North Carolina at Chapel Hill, United States
32 publications · 2.5K citations
26
h-index
- JV
24
h-index
- XC
20
h-index
- BF
17
h-index
- TK
16
h-index
1–5 of 11.8K
Institutions
2.1K
Centre National de la Recherche Scientifique
Paris, France
39 h-index
481 publications
21.6K citations
Stanford University
Stanford, United States
37 h-index
191 publications
14.9K citations
Chinese Academy of Sciences
Beijing, China
34 h-index
389 publications
35.4K citations
IBM Research - Thomas J. Watson Research Center
Yorktown Heights, United States
32 h-index
113 publications
10K citations
Arts et Métiers
Paris, France
31 h-index
163 publications
7.6K citations
National Institute for Materials Science
Tsukuba, Japan
24 h-index
115 publications
6.1K citations
Tohoku University
Sendai, Japan
23 h-index
155 publications
4.5K citations
The University of Osaka
Osaka, Japan
22 h-index
139 publications
5.8K citations
1–8 of 2.1K
Venues
- Applied Physics Letters
260 publications · 12.5K citations
58
h-index
- Journal of The Electrochemical Society
JES · 214 publications · 11.4K citations
57
h-index
- Journal of Applied Physics
230 publications · 16K citations
56
h-index
- Polymer Degradation and Stability
87 publications · 4K citations
40
h-index
- Japanese Journal of Applied Physics
JJAP · 122 publications · 3.7K citations
29
h-index
1–5