C. Chaneliere

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Active since

1997

Affiliations

Institut National des Sciences Appliquées de Lyon(Current)

Centre National de la Recherche Scientifique

Orange (France)

C. Chaneliere is an author at Institut National des Sciences Appliquées de Lyon specializing in materials science, materials engineering, and natural sciences.

Publications per year

1997–1999

Publications

Tantalum pentoxide (Ta2O5) thin films for advanced dielectric applications

C. Chaneliere, Jean‐Luc Autran, R. A. B. Devine et al. · Materials Science and Engineering R Reports · 1998 · 676 citations

Natural Sciences, Materials Engineering, Materials Science +14

Properties of amorphous and crystalline Ta2O5 thin films deposited on Si from a Ta(OC2H5)5 precursor

C. Chaneliere, S. Four, Jean‐Luc Autran et al. · Journal of Applied Physics · 1998 · 124 citations

Natural Sciences, Materials Engineering, Materials Science +17

Fabrication and characterization of Si-MOSFET's with PECVD amorphous Ta<sub>2</sub>O<sub>5</sub> gate insulator

Jean‐Luc Autran, R. A. B. Devine, C. Chaneliere et al. · IEEE Electron Device Letters · 1997 · 69 citations

Engineering, Electrical Engineering, Materials Science +17

Conduction mechanisms in Ta2O5/SiO2 and Ta2O5/Si3N4 stacked structures on Si

C. Chaneliere, Jean‐Luc Autran, R. A. B. Devine · Journal of Applied Physics · 1999 · 64 citations

Engineering, Materials Engineering, Materials Science +17

Comparison between the properties of amorphous and crystalline Ta2O5 thin films deposited on Si

C. Chaneliere, S. Four, Jean‐Luc Autran et al. · Microelectronics Reliability · 1999 · 36 citations

Natural Sciences, Materials Engineering, Materials Science +12

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