Thermodynamic considerations of thermal oxidation of metal silicides

Reaction of thin metal films with SiO2 substrates

R. Pretoriüs, Joel M. Harris, M.−A. Nicolet · Solid-State Electronics · 1978 · 300 citations

Natural Sciences, Materials Engineering, Materials Science +12

Thermodynamic considerations in refractory metal-silicon-oxygen systems

R. Beyers · Journal of Applied Physics · 1984 · 243 citations

Natural Sciences, Materials Engineering, Materials Science +17

Phase equilibria in thin-film metallizations

R. Beyers, Rodney Sinclair, Michael E. Thomas · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1984 · 157 citations

Natural Sciences, Materials Engineering, Materials Science +17

Oxidation mechanisms in WSi2 thin films

S. Zirinsky, W. Hammer, F. M. d’Heurle et al. · Applied Physics Letters · 1978 · 119 citations

Engineering, Materials Engineering, Materials Science +17

Oxidation of silicide thin films: TiSi2

F. M. d’Heurle, E. A. Irene, C. Y. Ting · Applied Physics Letters · 1983 · 76 citations

Natural Sciences, Chemistry, Materials Science +17