A multi-kilohertz pinch plasma radiation source for extreme ultraviolet lithography

Highly repetitive, extreme-ultraviolet radiation source based on a gas-discharge plasma

K. Bergmann, Guido Schriever, Oliver Rosier et al. · Applied Optics · 1999 · 98 citations

Natural Sciences, Physics, Plasma Physics +12

Intense xenon capillary discharge extreme-ultraviolet source in the 10–16-nm-wavelength region

Marc Klosner, W. T. Silfvast · Optics Letters · 1998 · 95 citations · Full text

Natural Sciences, Physics, Biomedical Optics +7

Radio-frequency-preionized xenon z-pinch source for extreme ultraviolet lithography

Malcolm W. McGeoch · Applied Optics · 1998 · 56 citations

Natural Sciences, Physics, Optics +12

Pinch-plasma radiation source for extreme-ultraviolet lithography with a kilohertz repetition frequency

K. Bergmann, Oliver Rosier, W. Neff et al. · Applied Optics · 2000 · 38 citations

Natural Sciences, Materials Science, Physics +10

EUV (13.5-nm) light generation using a dense plasma focus device

William N. Partlo, Igor V. Fomenkov, D.L. Birx · Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 1999 · 13 citations

Engineering, Electrical Engineering, Physics +10