Diagnostic study of low-pressure Ar– remote plasma generated in HCD-L 300 system: Relative density of O atom

Measurement of electron energy distribution in low-pressure RF discharges

Valery Godyak, R. B. Piejak, B. M. Alexandrovich · Plasma Sources Science and Technology · 1992 · 759 citations

Natural Sciences, Electrical Engineering, Microelectronics +15

Oxygen plasma etching for resist stripping and multilayer lithography

Mark A. Hartney, Dennis W. Hess, David S. Soane · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 197 citations

Engineering, Materials Engineering, Materials Science +16

On the use of actinometry to measure the dissociation in O₂DC glow discharges: determination of the wall recombination probability

Daniel Pagnon, J. Amorim, Jacimar Nahorny et al. · Journal of Physics D Applied Physics · 1995 · 161 citations

Natural Sciences, Chemistry, Physics +16

Characterization of transformer coupled oxygen plasmas by trace rare gases-optical emission spectroscopy and Langmuir probe analysis

Nicholas Fuller, M. V. Malyshev, Vincent M. Donnelly et al. · Plasma Sources Science and Technology · 2000 · 128 citations

Natural Sciences, Materials Science, Physics +15

Effect of Ar addition to an O2 plasma in an inductively coupled, traveling wave driven, large area plasma source: O2/Ar mixture plasma modeling and photoresist etching

Kazushige Takechi, M. A. Lieberman · Journal of Applied Physics · 2001 · 88 citations

Natural Sciences, Physics, Optics +14