Preparation of Ta/Mo structure by using RF-Dc coupled magnetron sputtering

Sputtering Yields of Metals for Ar+ and Ne+ Ions with Energies from 50 to 600 ev

N. Laegreid, G. K. Wehner · Journal of Applied Physics · 1961 · 807 citations

Natural Sciences, Materials Science, Physics +13

Internal stresses in metallic films deposited by cylindrical magnetron sputtering

John A. Thornton, J. Tabock, David W. Hoffman · Thin Solid Films · 1979 · 250 citations

Natural Sciences, Materials Engineering, Materials Science +16

Transparent, conductive CuI films prepared by rf-dc coupled magnetron sputtering

Takeshi Tanaka, Keishi KAWABATA, Masataka Hirose · Thin Solid Films · 1996 · 97 citations

Natural Sciences, Materials Engineering, Materials Science +11

Energetic particle bombardment of films during magnetron sputtering

S. M. Rossnagel · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1989 · 80 citations

Engineering, Materials Science, Plasma Physics +12

Very-Low-Temperature Epitaxial Silicon Growth By Low-Kinetic-Energy Particle Bombardment

Tadahiro Ohmi, Kiyohiko Matsudo, Tadashi Shibata et al. · Japanese Journal of Applied Physics · 1988 · 11 citations

Engineering, Electrical Engineering, Materials Science +17