Carrier mobility in advanced CMOS devices with metal gate and HfO2 gate dielectric - Concepedia

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Carrier mobility in advanced CMOS devices with metal gate and HfO2 gate dielectric

55

Citations

2

References

2003

Year

F. Lime, K. Oshima, M. Cassé, G. Ghibaudo, S. Cristoloveanu, B. Guillaumot, Hiroshi Iwai

Solid-State Electronics

Electrical EngineeringMetal GateEngineeringCarrier MobilityElectronic EngineeringBias Temperature InstabilityApplied PhysicsAdvanced Cmos DevicesMicroelectronicsSemiconductor Device

References

	Year	Citations

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