Concepedia

Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino, Shigeki Hiiro, Toshie Suzuki, Hideaki Machida

Thin Solid Films · 2002 · 45 citations · 2 references

DOI

Concepts

References

2

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing

Byoung Hun Lee, Laegu Kang, R. Nieh et al. · Applied Physics Letters · 2000 · 606 citations

, , +17

Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon

G. D. Wilk, Robert M. Wallace · Applied Physics Letters · 1999 · 504 citations

, , +17