Asako Hoshino

Statistics

Publications

Citations

133

H-Index

Active since

2000

Affiliations

Toyota Technological Institute(Current)

NEC (Japan)

Asako Hoshino is an author at Toyota Technological Institute specializing in chemical vapor deposition precursors, chemical vapor deposition materials, and chemical vapor deposition.

Publications per year

2000–2002

Publications

HfO2 growth by low-pressure chemical vapor deposition using the Hf(N(C2H5)2)4/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Journal of Crystal Growth · 2001 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +8

Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Thin Solid Films · 2002 · 45 citations

Natural Sciences, Chemistry, Materials Science +12

Hf1−xSixO2 deposition by metal organic chemical vapor deposition using the Hf(NEt2)4/SiH(NEt2)3/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Masato Ishikawa et al. · Thin Solid Films · 2002 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +10

Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Journal of Crystal Growth · 2000 · 14 citations

Natural Sciences, Materials Engineering, Materials Science +13

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