Concepedia

HfO2 growth by low-pressure chemical vapor deposition using the Hf(N(C2H5)2)4/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino, Shigeki Hiiro, Hideaki Machida

Journal of Crystal Growth · 2001 · 58 citations · 3 references

DOI

Concepts

References

3

Thermal stability and electrical characteristics of ultrathin hafnium oxide gate dielectric reoxidized with rapid thermal annealing

Byoung Hun Lee, Laegu Kang, R. Nieh et al. · Applied Physics Letters · 2000 · 606 citations

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Electrical properties of hafnium silicate gate dielectrics deposited directly on silicon

G. D. Wilk, Robert M. Wallace · Applied Physics Letters · 1999 · 504 citations

, , +17

Single-layer thin HfO/sub 2/ gate dielectric with n+-polysilicon gate

Laegu Kang, Yongjoo Jeon, K. Onishi et al. · 2002 · 31 citations

, , +17