Hideaki Machida

HfO2 growth by low-pressure chemical vapor deposition using the Hf(N(C2H5)2)4/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Journal of Crystal Growth · 2001 · 58 citations

Natural Sciences, Materials Engineering, Materials Science +8

Synthesis of Novel Sr Sources for Metalorganic Chemical Vapor Deposition of SrTiO₃

Takafumi Kimura, Hideaki Yamauchi, Hideaki Machida et al. · Japanese Journal of Applied Physics · 1994 · 55 citations

Natural Sciences, Materials Engineering, Materials Science +17

Robust self-assembled monolayer as diffusion barrier for copper metallization

Noboru Mikami, Nobuhiro Hata, Takamaro Kikkawa et al. · Applied Physics Letters · 2003 · 49 citations

Engineering, Materials Engineering, Materials Science +16

Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Thin Solid Films · 2002 · 45 citations

Natural Sciences, Chemistry, Materials Science +12

Improving crystalline quality of sputtering-deposited MoS₂ thin film by postdeposition sulfurization annealing using (t-C₄H₉)₂S₂

Seiya Ishihara, Yusuke Hibino, Naomi Sawamoto et al. · Japanese Journal of Applied Physics · 2016 · 38 citations

Engineering, Electrical Engineering, Materials Science +17