Low-pressure chemical vapor deposition of TaCN films by pyrolysis of ethylamido-tantalum

Chemical vapor deposition of vanadium, niobium, and tantalum nitride thin films

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1993 · 170 citations

Natural Sciences, Chemistry, Materials Science +15

Metalorganic chemical vapor deposition of tantalum nitride by tertbutylimidotris(diethylamido)tantalum for advanced metallization

Mei‐Hui Tsai, Shuo Sun, Hsin‐Tien Chiu et al. · Applied Physics Letters · 1995 · 78 citations

Natural Sciences, Materials Engineering, Materials Science +15

Low Temperature Deposition of TaCN Films Using Pentakis(diethylamido)tantalum

Gyu-Chang Jun, Sunglae Cho, Ki‐Bum Kim et al. · Japanese Journal of Applied Physics · 1998 · 24 citations

Natural Sciences, Materials Engineering, Materials Science +17

Effect of hydrogen on deposition of tantalum nitride thin films from ethylimidotantalum complex

Chiu Hsin-Tien, Wen Ping Chang · Journal of Materials Science Letters · 1992 · 15 citations

Natural Sciences, Materials Engineering, Materials Science +10