Toshie Suzuki

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Publications

Citations

130

H-Index

Active since

2002

Affiliations

NEC (Japan)(Current)

Toyota Technological Institute

Toshie Suzuki is an author at NEC (Japan) specializing in chemical vapor deposition materials, chemical vapor deposition, and chemical vapor deposition precursors.

Publications per year

2002–2008

Publications

Development of microchannel reactors using polysilane-supported palladium catalytic systems in capillaries

Masaharu Ueno, Toshie Suzuki, Takeshi Naito et al. · Chemical Communications · 2008 · 50 citations

Engineering, Chemical Engineering, Chemistry +17

Using tetrakis-diethylamido-hafnium for HfO2 thin-film growth in low-pressure chemical vapor deposition

Yoshio Ohshita, Atsushi Ogura, Asako Hoshino et al. · Thin Solid Films · 2002 · 45 citations

Natural Sciences, Chemistry, Materials Science +12

Effects of deposition conditions on step-coverage quality in low-pressure chemical vapor deposition of HfO2

Yoshio Ohshita, Atsushi Ogura, Akiko Hoshino et al. · Journal of Crystal Growth · 2002 · 19 citations

Natural Sciences, Materials Engineering, Materials Science +9

Hf1−xSixO2 deposition by metal organic chemical vapor deposition using the Hf(NEt2)4/SiH(NEt2)3/O2 gas system

Yoshio Ohshita, Atsushi Ogura, Masato Ishikawa et al. · Thin Solid Films · 2002 · 16 citations

Natural Sciences, Materials Engineering, Materials Science +10

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