Concepedia
Journal of Electronic Materials · 1999 · 25 citations · 2 references
Materials ScienceMaterials EngineeringSub-kev BoronIon ImplantationEngineeringBoron NitridePhysicsApplied PhysicsBf2 Ion ImplantsMicroelectronics
2
Optimization of RTA parameters to produce ultra-shallow, highly activated B+, BF 2 + , and As+ ion implanted junctions
Daniel F. Downey, S. Marcus, Judy W. Chow · Journal of Electronic Materials · 1998 · 16 citations
Rta Parameters, Electrical Engineering, Engineering +6
Ultra-shallow junction formation using very low energy B and BF/sub 2/ sources
C. M. Osburn, D.F. Downey, Susan B. Felch et al. · 2002 · 12 citations
Superconducting Material, Engineering, Semiconductor Device +16