Concepedia

Publication | Closed Access

Effects of “fast” rapid thermal anneals on sub-keV boron and BF2 ion implants

DOI

25

Citations

2

References

1999

Year

Daniel F. Downey, S. Falk, Adam Bertuch, S. Marcus
Journal of Electronic Materials

References

YearCitations

Optimization of RTA parameters to produce ultra-shallow, highly activated B+, BF 2 + , and As+ ion implanted junctions

Daniel F. Downey, S. Marcus, Judy W. Chow

Journal of Electronic Materials

1998

16

Ultra-shallow junction formation using very low energy B and BF/sub 2/ sources

C. M. Osburn, D.F. Downey, Susan B. Felch,

2002

12

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