Daniel F. Downey

Statistics

Publications

Citations

359

H-Index

Active since

1991

Affiliations

Varian Medical Systems (United States)(Current)

STEAG (Germany)

Helmholtz-Zentrum Dresden-Rossendorf

North Carolina State University

Daniel F. Downey is an author at Varian Medical Systems (United States) specializing in ion implantation, materials science, and materials engineering.

Publications per year

1991–2005

Publications

Effect of fluorine on the diffusion of boron in ion implanted Si

Daniel F. Downey, Judy W. Chow, E. Ishida et al. · Applied Physics Letters · 1998 · 110 citations · Full text

Natural Sciences, Materials Engineering, Materials Science +17

Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing

W. Skorupa, T. Gebel, R.A. Yankov et al. · Journal of The Electrochemical Society · 2005 · 83 citations

Engineering, Materials Engineering, Materials Science +17

The Effects of Small Concentrations of Oxygen in RTP Annealing of Low Energy Boron, BF<sup>2</sup> and Arsenic Ion Implants

Daniel F. Downey, Judy W. Chow, Wilfried Lerch et al. · MRS Proceedings · 1998 · 33 citations

Natural Sciences, Materials Engineering, Materials Science +14

Ultra-shallow junctions produced by plasma doping and flash lamp annealing

W. Skorupa, R.A. Yankov, W. Anwand et al. · Materials Science and Engineering B · 2004 · 30 citations

Engineering, Electrical Engineering, Physics +16

Effects of “fast” rapid thermal anneals on sub-keV boron and BF2 ion implants

Daniel F. Downey, S. Falk, Adam Bertuch et al. · Journal of Electronic Materials · 1999 · 26 citations

Natural Sciences, Materials Engineering, Materials Science +9

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