Concepedia

Daniel F. Downey

DF

Statistics

Publications

10

Citations

354

H-Index

10

Active since

1991

Affiliations

Varian Medical Systems (United States)(Current)

STEAG (Germany)

Helmholtz-Zentrum Dresden-Rossendorf

North Carolina State University

Daniel F. Downey is an author at Varian Medical Systems (United States) specializing in applied physics, engineering, and materials science.

Top concepts

EngineeringApplied PhysicsMaterial ScienceMicroelectronicsPhysicsElectrical EngineeringNanoelectronicsMaterials EngineeringSurface ScienceMass Spectrometry

Publications per year

1991–2005

10

Publications

10

Effect of fluorine on the diffusion of boron in ion implanted Si

Daniel F. Downey, Judy W. Chow, E. Ishida et al. · Applied Physics Letters · 1998 · 108 citations · Full text

Materials Science, Tilt Angle, Ion Implantation +12

Advanced Thermal Processing of Ultrashallow Implanted Junctions Using Flash Lamp Annealing

W. Skorupa, T. Gebel, R.A. Yankov et al. · Journal of The Electrochemical Society · 2005 · 82 citations

Engineering, Silicon On Insulator, Semiconductor Device +17

The Effects of Small Concentrations of Oxygen in RTP Annealing of Low Energy Boron, BF<sup>2</sup> and Arsenic Ion Implants

Daniel F. Downey, Judy W. Chow, Wilfried Lerch et al. · MRS Proceedings · 1998 · 32 citations

Materials Engineering, Materials Science, Ion Implantation +6

Ultra-shallow junctions produced by plasma doping and flash lamp annealing

W. Skorupa, R.A. Yankov, W. Anwand et al. · Materials Science and Engineering B · 2004 · 30 citations

Electrical Engineering, Engineering, Physics +7

Effects of “fast” rapid thermal anneals on sub-keV boron and BF2 ion implants

Daniel F. Downey, S. Falk, Adam Bertuch et al. · Journal of Electronic Materials · 1999 · 25 citations

Materials Science, Materials Engineering, Sub-kev Boron +7

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