7
Publications
418
Citations
7
H-Index
1995
Active since
E. Ishida is an author at Advanced Micro Devices (United States) specializing in engineering, applied physics, and microelectronics.
Top concepts
EngineeringApplied PhysicsMicroelectronicsMaterial ScienceElectrical EngineeringMicrostructureCrystalline DefectsPhysicsChemistryEducation
Publications per year
1995–2002
7
7
Effect of fluorine on the diffusion of boron in ion implanted Si
Daniel F. Downey, Judy W. Chow, E. Ishida et al. · Applied Physics Letters · 1998 · 108 citations · Full text
Study of electrical measurement techniques for ultra-shallow dopant profiling
E. Ishida, Susan B. Felch · Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena · 1996 · 14 citations
Device Modeling, Ultra-shallow Dopant Profiles, Electrical Engineering +13
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