Applied Physics Letters · 1973 · 33 citations · 4 references
EngineeringElectrical EngineeringPhysicsCondensed Matter PhysicsSemiconductor DevicesSemiconductor MaterialsDevice CharacterizationDevice ModelingDevice SimulationInterface ModelingSemiconductor InterfacesSemiconductor PhysicsInterface State KineticsInterface State ModelingInterface StatesSemiconductor Characterization
A MOS device has been modelled on a computer by using interface state parameters previously measured by a parallel conductance technique. A Gray-Brown measurement was simulated, and the resulting apparent interface state distribution was found to show a large peak near the band edge, although the known distribution was in fact monotonic. This spurious peak is associated with a rapid decrease in interface state capture cross section as the band edge is approached, and is seen when the measurement frequency is insufficiently high.
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DENSITY OF SiO2–Si INTERFACE STATES
Peter V. Gray, D.M. Brown · Applied Physics Letters · 1966 · 406 citations · Full text
Interface states in SiSiO2 interfaces
H.J. Deuling, E. Klausmann, A. Goetzberger · Solid-State Electronics · 1972 · 223 citations
Physical limitations of MOS structures
M.B. Das · Solid-State Electronics · 1969 · 38 citations
Natural Sciences, Electrical Engineering, Materials Science +14