Optimisation of SU-8 processing parameters for deep X-ray lithography

A comparative study of Pd/Sn/Au, Au/Ge/Au/Ni/Au, Au-Ge/Ni and Ni/Au-Ge/Ni ohmic contacts to n-GaAs

Md. Shafiqul Islam, P.J. McNally · Microelectronic Engineering · 1998 · 606 citations

Engineering, Electrical Engineering, Materials Science +14

High-aspect-ratio, ultrathick, negative-tone near-UV photoresist and its applications for MEMS

H. Lorenz, M. Despont, N. Fahrni et al. · Sensors and Actuators A Physical · 1998 · 573 citations · Full text

Engineering, Materials Engineering, Materials Science +12

Negative photoresists for optical lithography

Jane M. Shaw, Jeffrey D. Gelorme, N. LaBianca et al. · IBM Journal of Research and Development · 1997 · 339 citations

Engineering, Chemistry, Materials Science +14

A new fabrication process for ultra-thick microfluidic microstructures utilizing SU-8 photoresist

Che‐Hsin Lin, Gwo‐Bin Lee, Baowen Chang et al. · Journal of Micromechanics and Microengineering · 2002 · 307 citations

Engineering, Materials Engineering, Materials Science +15

Polymerization optimization of SU-8 photoresist and its applications in microfluidic systems and MEMS

J Zhang, Kai Tan, Guha Hong et al. · Journal of Micromechanics and Microengineering · 2000 · 225 citations

Engineering, Materials Engineering, Materials Science +17