Thin Solid Films · 2008 · 37 citations · 8 references
Natural SciencesMaterials SciencePhysicsSpectroscopyIon ImplantationExperimental CharacterizationSputter DepositionSputter IonizationSputteringSputtering ProcessesSputtering TechniquesSurface Sputtering
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Etching yield of SiO2 irradiated by F+, CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV
Kazuhiro Karahashi, Ken-ichi Yanai, Kenji Ishikawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 81 citations
Natural Sciences, Materials Engineering, Materials Science +17