Kazuhiro Karahashi

Future of plasma etching for microelectronics: Challenges and opportunities

G. S. Oehrlein, Stephan M. Brandstadter, Robert L. Bruce et al. · Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena · 2024 · 103 citations · Full text

Materials Science, Electrical Engineering, Digital Twins +14

Progress in nanoscale dry processes for fabrication of high-aspect-ratio features: How can we control critical dimension uniformity at the bottom?

Kenji Ishikawa, Kazuhiro Karahashi, Tatsuo Ishijima et al. · Japanese Journal of Applied Physics · 2018 · 95 citations · Full text

Engineering, Target Fabrication, Soft Matter +23

Etching yield of SiO2 irradiated by F+, CFx+ (x=1,2,3) ion with energies from 250 to 2000 eV

Kazuhiro Karahashi, Ken-ichi Yanai, Kenji Ishikawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2004 · 80 citations

Materials Science, Materials Engineering, Chemical Engineering +15

Hydrogen effects in hydrofluorocarbon plasma etching of silicon nitride: Beam study with CF+, CF2+, CHF2+, and CH2F+ ions

Tomoko Ito, Kazuhiro Karahashi, Masanaga Fukasawa et al. · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 2011 · 68 citations · Full text

Engineering, Physics, Microfabrication +15

Mass-analyzed CFx+ (x=1,2,3) ion beam study on selectivity of SiO2-to-SiN etching and a-C:F film deposition

Ken-ichi Yanai, Kazuhiro Karahashi, Kenji Ishikawa et al. · Journal of Applied Physics · 2005 · 68 citations

Engineering, Ion Beam Study, Vacuum Device +16