Sputter Ionization is a type of secondary ionization technique in which atoms or molecules are ionized through the ejection of material from a solid surface by energetic ion bombardment, distinguishing it from other ionization methods by its reliance on physical sputtering processes for ion production.
405
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16.4K
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1.1K
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Publications per year
2017–2026
22
Parents
Publications
405
Secondary Ion Mass Spectrometry
Analytica Chimica Acta · 1993 · 1.1K citations
Cluster primary ion bombardment of organic materials
Felix Kollmer · Applied Surface Science · 2004 · 285 citations
1–5 of 405
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- AD
7
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- SMS. M. Rossnagel
IBM Research - Thomas J. Watson Research Center, United States
6 publications · 671 citations
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- AW
6
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- AS
5
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- MT
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Institutions
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Centre National de la Recherche Scientifique
Paris, France
15 h-index
63 publications
1.5K citations
Université Paris-Sud
Orsay, France
12 h-index
38 publications
1.1K citations
Pennsylvania State University
State College, United States
11 h-index
22 publications
619 citations
UCLouvain
Louvain-la-Neuve, Belgium
8 h-index
22 publications
478 citations
Uppsala University
Uppsala, Sweden
8 h-index
31 publications
961 citations
Max Planck Institute for Plasma Physics
Garching, Germany
7 h-index
22 publications
1.4K citations
University of Münster
Münster, Germany
7 h-index
19 publications
1K citations
Saha Institute of Nuclear Physics
Kolkata, India
7 h-index
15 publications
422 citations
1–8 of 351
Venues
- Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms
74 publications · 1.6K citations
24
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- Surface Science
36 publications · 1.4K citations
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- Journal of Applied Physics
17 publications · 1.1K citations
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- Applied Surface Science
25 publications · 1.3K citations
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- Journal of Vacuum Science & Technology A Vacuum Surfaces and Films
15 publications · 712 citations
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