physica status solidi (a) · 2001 · 29 citations · 5 references
EngineeringMaterials EngineeringMaterials ScienceOptical MaterialsOptoelectronicsSemiconductor MaterialsLight-emitting DiodesNanostructured Electronic MaterialsOptical Properties Of SemiconductorsQuantum WellsSemiconductor Device MaterialsWide-bandgap SemiconductorsGallium NitrideGallium Nitride (Gan) MaterialsMetalorganic Vapor Phase EpitaxyOptical PropertiesQuantum Well StructuresSpontaneous EmissionTemperature DependenceUltraviolet Light-emitting Diodes
We demonstrated room temperature (RT) intense ultraviolet (UV) emission with wavelength in the range of 300–340 nm from InxAlyGa1—x—yN quaternary alloys grown by metal organic vapor phase epitaxy (MOVPE). We found that the UV emission is considerably enhanced by In segregation upon introducing approximately 5% of In into AlGaN. We fabricated multi-quantum wells (MQWs) consisting of Inx1Aly1Ga1—x1—y1N wells and Inx2Aly2Ga1—x2—y2N barriers. The intensity of the 320 nm band emission from the InAlGaN-based MQWs was as strong as that of the 410 nm band emission from InGaN-based QWs at RT. We also fabricated an InAlGaN/InAlGaN single (S)QW and clearly observed In segregation of submicron size from cathodoluminescence (CL) images. The temperature dependence of photoluminescence (PL) emission for InAlGaN-based QWs was greatly improved in comparison with that of GaN- or AlGaN-based QWs. We also achieved a hole concentration of 3 × 1017 cm—3 for large bandgap (around 4 eV) quaternary InxAlyGa1—x—yN by Hall measurements. Finally, we fabricated UV light-emitting diodes (LEDs) using InAlGaN active region and achieved efficient 345 nm emission.
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Luminescences from localized states in InGaN epilayers
Shigefusa F. Chichibu, T. Azuhata, T. Sota et al. · Applied Physics Letters · 1997 · 405 citations
230 to 250 nm Intense Emission from AlN/AlGaN Quantum Wells
Hideki Hirayama, Y. Enomoto, A. Kinoshita et al. · physica status solidi (a) · 2000 · 13 citations