Concepedia

Influence of plasma excitation frequency fora-Si:H thin film deposition

H. Curtins, N. Wyrsch, M. Favre, A. Shah

Plasma Chemistry and Plasma Processing · 1987 · 170 citations · 9 references

DOI

Concepts

References

9

Direct measurement of gap-state absorption in hydrogenated amorphous silicon by photothermal deflection spectroscopy

Warren B. Jackson, Nabil M. Amer · Physical review. B, Condensed matter · 1982 · 604 citations · Full text

, , +17

High-rate deposition of amorphous hydrogenated silicon: effect of plasma excitation frequency

H. Curtins, N. Wyrsch, A. Shah · Electronics Letters · 1987 · 151 citations

, , +17

Optical absorption spectra of surface or interface states in hydrogenated amorphous silicon

W. B. Jackson, D. K. Biegelsen, R. J. Nemanich et al. · Applied Physics Letters · 1983 · 123 citations

, , +17

Comparison of microwave and lower frequency plasmas for thin film deposition and etching

M. R. Wertheimer, M. Moisan · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1985 · 122 citations

, , +15

Frequency effects in plasma etching

Daniel Flamm · Journal of Vacuum Science & Technology A Vacuum Surfaces and Films · 1986 · 76 citations

, , +17