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Optical absorption spectra of surface or interface states in hydrogenated amorphous silicon
123
Citations
14
References
1983
Year
Optical MaterialsEngineeringOptical AbsorptionAbsorption SpectroscopyOptoelectronic DevicesIntegrated CircuitsDefect AbsorptionSilicon On InsulatorSemiconductorsOptical PropertiesThin Film ProcessingMaterials ScienceCrystalline DefectsPhysicsInterface StatesSemiconductor MaterialElectronic MaterialsSurface ScienceApplied PhysicsOptical Absorption SpectraAmorphous SiliconLight AbsorptionThin FilmsAmorphous Solid
The optical absorption of doped and undoped hydrogenated amorphous silicon (a-Si:H) films ranging from 5 nm to 10 μm was measured using photothermal deflection spectroscopy. The absorption spectra show that there is a high defect layer associated with the surface or interface of the film. From comparison of defect absorption and dangling bond spin densities, it is found that a-Si:H films which have ∼1015 bulk defects/cm3 exhibit surface or interface layers with ∼1012 dangling bonds/cm2.
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