H. Curtins

Influence of plasma excitation frequency fora-Si:H thin film deposition

H. Curtins, N. Wyrsch, M. Favre et al. · Plasma Chemistry and Plasma Processing · 1987 · 170 citations

Engineering, Surface Science, Applied Physics +3

High-rate deposition of amorphous hydrogenated silicon: effect of plasma excitation frequency

H. Curtins, N. Wyrsch, A. Shah · Electronics Letters · 1987 · 151 citations

Electrical Engineering, Ion Implantation, Engineering +15

Dependence of electrical conductivity of nanocrystalline silicon on structural properties and the effect of substrate bias

M. Konuma, H. Curtins, F.-A. Sarott et al. · Philosophical Magazine B · 1987 · 50 citations

Engineering, Electrical Conductivity, Semiconductor Materials +24

VHF Plasma Deposition: A Comparative Overview

A. Shah, Joydeep Dutta, N. Wyrsch et al. · MRS Proceedings · 1992 · 49 citations

Electrical Engineering, Engineering, Magnetohydrodynamics +5

Study of surface/interface and bulk defect density in a-Si:H by means of photothermal deflection spectroscopy and photoconductivity

M. Favre, H. Curtins, A. Shah · Journal of Non-Crystalline Solids · 1987 · 45 citations

Materials Science, Engineering, Surface Science +6