Applied Physics Letters · 1993 · 69 citations · 8 references
EngineeringMaterials EngineeringMaterials ScienceElectronic MaterialsSemiconductor MaterialsThin FilmsChemical Vapor DepositionSemiconductor Crystal GrowthSemiconductor Device MaterialsSemiconductor PhysicsSemiconductor Thin FilmsWide-bandgap SemiconductorsCarrier ConcentrationCrystallinityGallium NitrideGallium Nitride (Gan) MaterialsGallium Nitride Crystal GrowthMetalorganic Chemical Vapor DepositionNitride Thin FilmsPhysical Properties
A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (011̄2) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (011̄2) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (011̄2) sapphire. The results of this study show better physical properties of GaN thin films achieved on (011̄2) sapphire.
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Isamu Akasaki, Hiroshi Amano, Yasuo Koide et al. · Journal of Crystal Growth · 1989 · 688 citations
Optical studies of the phonons and electrons in gallium nitride
Delphine Manchon, A. S. Barker, P. Dean et al. · Solid State Communications · 1970 · 184 citations