Aspects of TiN and Ti deposition in an ECR plasma enhanced CVD process

Chemical vapor deposition of titanium nitride at low temperatures

Sarah Kurtz, Roy G. Gordon · Thin Solid Films · 1986 · 221 citations

Materials Science, Engineering, Powder Metallurgy +4

Synthesis of thin films by atmospheric pressure chemical vapor deposition using amido and imido titanium(IV) compounds as precursors

Renaud M. Fix, Roy G. Gordon, David M. Hoffman · Chemistry of Materials · 1990 · 176 citations

Engineering, Chemical Analysis, Altmetric Attention Score +16

Silicon oxide deposition from tetraethoxysilane in a radio frequency downstream reactor: Mechanisms and step coverage

Nur Selamoglu, J. A. Mucha, D. E. Ibbotson et al. · Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena · 1989 · 112 citations

Materials Science, Chemical Engineering, Low Teos Flow +10

Infrared Studies of the Surface and Gas Phase Reactions Leading to the Growth of Titanium Nitride Thin Films from Tetrakis(dimethylamido)titanium and Ammonia

Lawrence H. Dubois, Bernard R. Zegarski, Gregory S. Girolami · Journal of The Electrochemical Society · 1992 · 108 citations

Materials Science, Materials Engineering, Engineering +15

Kinetical Aspects of the LPCVD of Titanium Nitride from Titanium Tetrachloride and Ammonia

M. J. Buiting, A. F. Otterloo, A.H. Montree · Journal of The Electrochemical Society · 1991 · 93 citations

Engineering, Kinetical Aspects, Chemistry +18